ELECTRON BEAM IRRADIATION OF C60(OH)10
Abstract
The polyhydroxylated fullerene derivative, or fullerol, C60(OH)10, has been investigated as an electron beam resist. Films of fullerol of ∼ 200 nm thickness, were prepared on silicon substrates using spin coating. Upon exposure with electrons at 20 keV the fullerol displayed negative tone resist behaviour after development with isopropyl alcohol:cyclohexanone (1 : 4). The fullerol became insoluble after exposure to a dose of ∼ 10 mC/cm2 for 20 keV electrons.References
R.P. Cowburn and M.E. Welland, Science
(2000) 1466.
K.I. Bolotin, K.J. Sikes, Z. Jiang, M. Klima, G.
Fudenberg, J. Hone, P. Kim and H.L.
Stormer, Solid State Communications 146
(2008) 351.
H. Kawano, H. Ito, K. Mizuno, T. Matsuzaka,
K. Kawasaki, N. Saitou, H. Ohta and Y.
Sohda, J. Vac. Sci. Technol. B21 (2003) 823.
Y. Machida, T. Maruyama, Y. Kojima, S.
Sugatani, H. Tsuchikawa, K. Ogino and H.
Hoshino, Microelectronic Eng. 87 (2010)
T. Ito and S. Okazaki, Nature 406 (2000)
E. Slot, M.J. Wieland, G. de Boer, P. Kruit,
G.F. ten Berge, A.M.C. Houkes, R. Jager, T.
van de Peut, J.J.M. Peijster, S.W.H.K.
Steenbrink, T.F. Teepen, A.H.V. van Veen
and B.J. Kampherbeek, P. Soc. Photo-Opt.
Inst. 6921 (2008) 69211P.
P. Petric, C. Bevis, A. Carroll, H. Percy, M.
Zywno, K. Standiford, A. Brodie, N. Bareket
and L. Grella, J. Vac. Sci. Technol. B27
(2009) 161.
J. Kretz, L. Dreeskornfeld, G. Ilicali, T. Lutz
and W. Weber, Microelectronic Eng. 78-79
(2005) 479.
T. Tada, T. Kanayama, A.P.G. Robinson,
R.E. Palmer, M.T. Allen, J.A. Preece and
K.D.M. Harris, Microelectronic Eng. 53 (2000)
T. Tada and T. Kanayama, Jpn. J. Appl.
Phys. 35, Part 2 (1996) L63.
T. Tada and T. Kanayama, J. Photopolym.
Sci. Technol. 10 (1997) 647.
A.P.G.Robinson, R.E. Palmer, T. Tada, T.
Kanayama and J.A. Preece, Appl. Phys Lett.
(1998) 1302.
X. Chen, A.P.G. Robinson, M. Manickam and
J.A. Preece, Microelectron. Eng. 84 (2007)
A.P.G. Robinson, R.E. Palmer, T. Tada, T.
Kanayama T, E.J. Shelley, D. Philp and J.A.
Preece, Mater. Res. Soc. Symp. Proc. 548
(2000) 115.
F.P. Gibbons, A.P.G. Robinson, R.E. Palmer,
M. Manickam and J.A. Preece, Small 2
(2006) 1003.
F.P. Gibbons, A.P.G. Robinson, S. Diegoli,
M. Manickam, J.A. Preece and R.E. Palmer,
Adv. Funct. Mater. 18 (2008) 1977.
J. Manyam, M. Manickam, J.A. Preece, R.E.
Palmer and A.P.G. Robinson, P. Soc. PhotoOpt. Inst. 7273 (2009) 72733D.
F.P. Gibbons, M. Manickam, J.A. Preece,
R.E. Palmer and A.P.G. Robinson, Small 5
(2009) 2750.
F.P. Gibbons, R.E. Palmer and A.P.G.
Robinson, Unpublished data.
M. Wang, C-T Lee, C.L. Henderson and K.E.
Gonsalves, J. Photopolym. Sci. Technol. 21
(2008) 747.
H. Yamamoto, T. Kozawa, S. Tagawa, T.
Ando, K. Ohmori, M. Sato and J. Onodera, P.
Soc. Photo-Opt. Inst. 6923, (2008) 69230N.
H. Yamamoto, T. Kozawa, S. Tagawa, T.
Ando, K. Ohmori, M. Sato and J. Onodera, P.
Soc. Photo-Opt. Inst. 7639 (2010) 76390U.
X. Chen, R.E. Palmer and A.P.G. Robinson,
Nanotechnology 19 (2008) 275308.
J-M. Zhang, W. Yang, P. He and S-Z. Zhu,
Chinese J. Chem. 22 (2004) 1008.
